Atmospheric Pressure Spatial Atomic Layer Deposition (AP

Atmospheric Pressure Spatial Atomic Layer Deposition (AP-SALD): a
new technique allowing the fast and scalable “printing” of functional
oxides.
Dr. David Muñoz-Rojas
Laboratoire des Matériaux et du Génie Physique (LMGP), University
Grenoble Alpes, CNRS, F-38000, Grenoble, France
Abstract
AP-SALD is a new approach to ALD in which precursors are separated in space rather
than in time (as is the case for conventional ADL). This approach eliminates the need
for purges and vacuum processing thus rendering the technique much faster, up to two
orders of magnitude, and cheaper and easier to scale up. A short description of the
different engineering approaches to Spatial ALD will be provided and the new APSALD deposition system recently implemented in the LMGP will be presented. Finally,
some examples of application of AP-SALD in the deposition of active and passive
components for new generation photovoltaic cells will be given.
In this seminar, I will introduce a novel technique, namely, atmospheric spatial atomic
layer deposition (SALD) that allows the fast deposition of high quality oxides. ShortBio/CV
Dr. David Muñoz-Rojas received his degree in organic chemistry in
1999 and master’s degree in chemical engineering (2000) from the
Instituto Químico de Sarrià (IQS, Barcelona), obtaining the P.
Salvador Gil, S.I. 2000 prize. He did his PhD in materials science
(2004) at the Instituto de Ciencia de Materiales de Barcelona (CSICUAB). Thereafter, he worked as a postdoc at the Laboratoire de
Réactivité et Chimie des Solides in Amiens (France), the Research
Centre for Nanoscience and Nanotechnology in Barcelona, and the
University of Cambridge (Device Materials Group). Dr. Muñoz-Rojas
is currently a permanent CNRS researcher at the Laboratoire des Matériaux et du Génie
Physique in Grenoble, France. His research focuses on using and developing cheap and scalable
chemical approaches for the fabrication of novel functional materials for electronic and
optoelectronic applications. In particular, he has pioneered the development of the novel spatial
atomic layer deposition (SALD) technique for the deposition of active components for
optoelectronic devices. He is currently further developing SALD to extend the
possibilities and fields of application of this exciting technique.
https://sites.google.com/site/workdmr/